Low mass power tape specifications
Requirements
Design
Under development:
Production
Quality control and testing
Requirements
index
carry HV, power, sensing and control levels from PP2 to detector
modules
Modularity:
basic modularity given by the SCT power distribution philosophy
each module served individually => 1 tape per module
-
barrel: 6 tapes (half-stave) - 1 harness: module <-> PPB1 <-> PPB2
-
forward: 2-3 tapes PPF0 <-> PPF1, 5-6 tapes PPF1 <-> PPF2
each harness shielded individually, shields connected at PP1
Length:
based on Technical Design Report, PP2 in-between LAr electronic boxes
barrel
-
0.8 - 1.6 m module to PP1
-
4.6 m PP1 to PP2 (?)
forward
-
1.3 - 3.1 m PP0 to PP1
-
2.1 m PP1 to PP2 (?)
High Voltage
according to SCT Bias Voltage Power Specification V2.03
(draft)
-
V_max = 500 V (HV component rating)
-
I_max = 5 mA
Low Voltage
according to ATLAS SCT Low Voltage Power Specification
V2.0 (draft)
DMILL process limit for ABCD chip: V_max
= 5.5 V (on chip)
analog (ABCD bipolar FE):
-
I_cc_max = 1.3 A (prel.)
-
V_cc_nominal = 3.5 V
digital (ABCD + opto CMOS)
-
I_dd_max = 1.0 A (prel.)
-
V_dd_nominal = 4 V
PIN bias
-
V_max = 10 V
-
I_max = 2 mA
VECSEL drivers
-
V_max = 6.6 V
-
I_max = 10 mA
Sensing and control
Sensing
-
temperature on module (2 on barrel)
-
V_cc, V_dd and respective returns at module connector
Control
SELECT for clock (opto redundancy scheme)
-
V_nominal = 4.0 V
-
I_max = 1 mA
RESET module
-
V_nominal = 4.0 V
-
I_max = 1 mA
all lines but RESET carry DC levels
Additional requirements
Maximize conductivity
-
minimize V drop to stay under V_max = 5.5 V
under any scenario
-
minimize power dissipation
Minimize material in sensitive region
-
minimize radiation length
-
minimize interaction length
importance of material grows towards interaction point !
Minimize space
severe space constraints all way through ATLAS detector
identified hot spots (so far)
-
from gap in-between LAr electronic boxes (ID X-sect 3500 cm2)
-
in-between tile nooses under mu-chambers (ID X-sect 5300 cm2)
Transmission line properties
-
maximize coupling capacitance (RF filter)
-
minimize inductance (loop)
Radiation hardness up to
-
100 kGy ionizing radiation
-
2.x 1014 n/cm2 (1
MeV neutron NIEL equivalent)
Basic design considerations
long but simple, two-layer flexible circuit design with conductor/KAPTON
laminates
IPC standards for flexible printed
circuits taken as design guidelines
caveat: no IPC standards exist for aluminium
flexes
0.5 mm track and gap grid chosen to match 1 mm pitch, (25 mil = 0.635
mm felt too risky)
Tape design
index
group lines into
low current - minimal 0.5 mm tracks
-
HV
-
HV_ret
-
V_cc_sense
-
A_gnd_sense
-
V_dd_sense
-
D_gnd_sense
-
TEMP_1
-
TEMP_2 (barrel only)
-
PIN_bias
-
ILED_a
-
ILED_b
-
SELECT
-
RESET
12(13 in barrel) narrow
tracks
high current - wide tracks
4 wide tracks
group track in two layers with matching supplies and returns for RF
filtering and minimal loops
obey IPC-2223 specification for HV separation (500 V -> 2.5 mm)
take 50 um Al as conductor for inner part up to PP1 (4x smaller
X0 than Cu for same conductivity)
take 70 um Cu as conductor for
outer part (> 2x better conductivity than 50 um Al)
21 mm tape width compatible with on-barrel engineering constraints
9 mm remain for power lines, shared equally between digital and analog
keep same design also for outer part
view barrel
design and forward
design
Tape construction
index
basic material from GTS Ltd. (holder of ISO 9001 )
matched product line
-
Al(Cu)/Kapton FPC laminate with PU glue
-
glue
-
glue/Kapton coverlayer
PU glue tested by CERN-TIS for radiation hardness, Kapton specified radiation
hard
inner part - "thin" low-mass tape
bottom to top
-
25 um Kapton/25 um PU glue/50 um Al laminate (GTS prod. # 660210AL)
-
25 um glue (GTS prod. # 102100)
-
25 um Kapton/25 um PU glue/50 um Al laminate (GTS prod. # 660210AL)
-
25 um glue/12.5 um Kapton coverlayer (GTS prod. # 322190)
outer part - "thick" low-mass tape
bottom to top
-
50 um Kapton/25 um PU glue/70 um Cu laminate (GTS prod. # 760220ED)
-
25 um glue (GTS prod. # 102100)
-
50 um Kapton/25 um PU glue/70 um Cu laminate (GTS prod. # 760220ED)
-
25 um glue/12.5 um Kapton (GTS prod. # 322190)
tape ends chemicaly Ni/Au plated for contact/soldering according to IPC-6013
Class 3
-
Ni minimal layer thickness: 1.3 um
-
Au maximal layer thickness: 0.8 um
Tape Properties
index
Resistivity
of 4.5 mm power lines
-
250 mOhm/m round trip (thin)
-
110 mOhm/m round trip (thick)
of 0.5 mm lines
-
2.24 Ohm/m round trip (thin)
-
0.97 Ohm/m round trip (thick)
all values with nominal values for Al and Cu resistivity,
-
Al : 2.8 uOhm.cm
-
Cu: 1.7 uOhm.cm
GTS sheet resistance spec for Al 2.5 - 2.7 uOhm.cm (?)
view voltage
drop table for baseline SCT power distribution
Material
input:
-
X0(Cu) = 1.43 cm
-
X0(Al) = 8.9 cm
-
X0(Kapton) = 35 cm; all glues assumed ~kapton
The width of all conductors is
4*4.5 + 13(12)*0.5 = 24.5(24) mm (in brackets forward cables without
the TEMP2 line)
X-section of plastic
-
thin: 21 mm * (25(K) + 25(G) + 25(G) + 25(K) + 25(G) + 25(G)
+ 12.5(K)) um = 3.4 x 10-2 cm-2
-
thick: 21 mm * (50(K) + 25(G) + 25(G) + 50(K) + 25(G) + 25(G) + 12.5(K))
um = 4.5 x 10-2 cm-2
Radiation length seen at perpendicular impact for one cable (w
-
width over which the material is spread)
single thin tape
X1 / X0 = (S/X0 (Al})
+ S/X0 ({plastic})) / w
= (1.23(1.20) mm2
/
89 mm + 3.4 mm2 / 350 mm) / w = (0.014 + 0.010)
mm / w
= 0.024 mm / w
single thick tape
X1 / X0 = (S/X0 (Cu})
+ S/X0 ({plastic})) / w
= (1.72(1.68) mm2
/
14.3 mm + 3.4 mm2 / 350 mm) / w = (0.0120(0.118)
+ 0.010) mm / w
= 0.130(0.128) mm / w
thin cable
spread over cable (w = 21 mm) X = 0.114 % X0
spread over module (w = 60 mm) X = 0.040 % X0
end of stave over module (6 cables) X = 0.24 % X0
outer barrel radius (1056 cables, r = 520 mm) X = 1056
*
X1 / (2.pi * r) = 0.78 % X0 (this
should be the maximum)
at cryostat wall (1056 cables, r = 1150 mm) X = 1056
*
X1 / (2.pi * r) = 0.35 % X0
at end of forward cylinder (988 cables, r = 590 mm) X =
988 *
X1 / (2.pi * r) = 0.64 % X0
(maximum in forward)
Beware of fast conclusions from these numbers ! In
the worst case, tapes are traversed twice and at an angle of 35o
(barrel) or 13o (forward).
The worst-case material estimate in thin
low-mass tapes seen by particles is therfefore 2.7
% X0 in the barrel and 3.5
% X0 in the forward.
thick cable
spread over cable (w = 21 mm) X = 0.619(0.610) % X0
spread over cryostat bore (1056 barrel cables, r = 1150 mm) X
=
1056 *
X1 / (2.pi * r) = 1.90 % X0
on cryostat face (1056 barrel + 988 forward cables, r = 1200 mm)
X
=
(1056 * 0.130 + 988 * 0.128) / (2.pi * r) =
3.49
% X0 (maximum)
Space and routing
X-sections, nominal thickness (measured somewhat smaller)
-
2.1 * 0.02625 = 0.055 cm2 (thin)
-
2.1 * 0.03525 = 0.074 cm2 (thick)
envelopes, shielding (50 um foil per harness) & packing factors (1.2)
not taken into account
minimal bending radius: 10 x tape thickness (IPC-2223 5.2.4.2.)
-
rmin = 3. mm (thin)
-
rmin = 4. mm (thick)
thin tape (no IPC for Al !) tested:
bending over a mandrel (r = 5, 2, 0.75 mm), 100 180o
bends, repetition 1 Hz
result:
-
r = 5 mm O.K.
-
r = 2 mm O.K.
-
r = 0.75 mm
-
30 bends O.K.
-
50 bends 1 broken line
-
100 bends 3 broken lines
Al tape safe, if IPC recommendations followed
Transmission line properties
eps (Kapton) = 3.5
eps (glue) = eps (Kapton)
capacitance: C / l = eps * eps0 * w / d
-
1.9 nF/m (thin)
-
1.4 nF/m (thick)
inductance: L / l = u0 d / w
-
20. nH/m (thin)
-
28. nH/m (thick)
for comparison: flat (TP) ribbon cables: C/l typically
50 pF/m, L/l 700 nH/m
Production
index
Production is with a standard photolithographic process adapted
to the size of the circuits.
Mask production
Laminate polishing
Photo-resist lamination
Photo-resist exposure
Photo-resist development
Conductor etching
Photo-resist stripping
Polishing
Ni/Au deposition
Laminate/glue/laminate/coverlay pressing
Tape cutting
Quality control and testing
index
Production steps are carried out according to production sheets of the
producer (available in Slovenian). Quality control actions for separate
steps are as follows:
Mask production
Laminate polishing
Photo-resist lamination
Photo-resist exposure
Photo-resist development
Conductor etching
Photo-resist stripping
Polishing
Ni/Au deposition
Laminate/glue/laminate/coverlay pressing
Tape cutting